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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

Bog
  • Format
  • Bog, hardback
  • Engelsk

Beskrivelse

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

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Detaljer
  • SprogEngelsk
  • Sidetal254
  • Udgivelsesdato26-05-2009
  • ISBN139780815512882
  • Forlag William Andrew Publishing
  • MålgruppeFrom age 0
  • FormatHardback
Størrelse og vægt
  • Vægt470 g
  • Dybde1,6 cm
  • coffee cup img
    10 cm
    book img
    15,2 cm
    22,9 cm

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